Microspin Technologies

Silicon/Sapphire Prepatterns for Lithography-Free Fabrication

Microspin Technologies offers high-quality silicon and sapphire wafers featuring pre-patterned structures. These substrates are meticulously designed to streamline the fabrication of micro- and nano-devices, enabling researchers to accelerate their prototyping phase by reducing or eliminating complex lithography steps.

Key Features & Advantages:

• High-Quality Substrates: Choice of prime-grade silicon or sapphire wafers ensuring excellent material properties.
• Precision Patterning: Structures are fabricated using advanced techniques to guarantee high resolution and fidelity.
• Lithography-Free/Simplified Workflow: Ideal for rapid prototyping, proof-of-concept studies, or when direct lithography access is limited. Allows deposition of materials directly onto pre-defined areas.
• Standard & Custom Patterns: We offer a range of standard patterns suitable for common device geometries (e.g., Hall bars, co-planar waveguides, electrode arrays). Custom pattern design and fabrication services are available to meet specific research needs.
• Surface Quality: Substrates are prepared to ensure optimal surface smoothness and cleanliness for subsequent material deposition and device processing.

Applications:

• Fabrication of Hall effect sensors and magnetotransport devices.
• Development of micro-waveguide structures for high-frequency applications.
• Prototyping of spintronic devices such as GMR/TMR sensors.
• Creation of test structures for material characterization.
• Educational purposes for hands-on device fabrication.

Our pre-patterned substrates provide a convenient and cost-effective solution for researchers and engineers working on micro- and nano-scale devices. By simplifying the fabrication process, we help you focus on innovation and discovery. Contact us to discuss your specific requirements or to inquire about our standard patterns.